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Designing CMOS compatible efficient ohmic contacts to WSi2N4 via surface-engineered Mo2B monolayer electrodes

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成果类型:
期刊论文
作者:
Cao, Liemao;Deng, Xiaohui;Tang, Zhen-kun;Tan, Rui;Ang, Yee Sin
通讯作者:
Ang, YS
作者机构:
[Tan, Rui; Cao, Liemao; Deng, Xiaohui; Tang, Zhen-kun] Hengyang Normal Univ, Univ Hunan Prov, Coll Phys & Elect Engn, Key Lab Micronano Energy Mat & Applicat Technol, Hengyang 421002, Peoples R China.
[Ang, Yee Sin] Singapore Univ Technol & Design SUTD, Sci Math & Technol SMT, 8 Somapah Rd, Singapore 487372, Singapore.
通讯机构:
[Ang, YS ] S
Singapore Univ Technol & Design SUTD, Sci Math & Technol SMT, 8 Somapah Rd, Singapore 487372, Singapore.
语种:
英文
期刊:
Journal of Materials Chemistry C
ISSN:
2050-7526
年:
2024
卷:
12
期:
2
页码:
648-654
基金类别:
National Natural Science Foundation of China [12104136]; National Natural Science Foundation of China [21B0622, 21C0549]; Scientific Research Found of Hunan Provincial Education Department [2022JJ40008, 2023JJ30094]; Hunan Provincial Natural Science Foundation of China [2021QD12]; Science Foundation of Hengyang Normal University of China [MOE-T2EP502210019]; Singapore Ministry of Education (MOE) Academic Research Fund (AcRF) Tier 2 Grant [202203]; SUTD-ZJU IDEA Thematic Research Grant (SUTD-ZJU (TR))
机构署名:
本校为第一机构
院系归属:
物理与电子工程学院
摘要:
Forming ohmic contacts between metals and semiconductors is critical to achieving high-performance and energy-efficient electronics. Here we investigate the interface properties of WSi2N4 contacted by Mo2B, O-modified Mo2B (Mo2BO2) and OH-modified Mo2B (Mo2B(OH)(2)) nanosheets using density functional theory simulations. We show that WSi2N4 and Mo2B form n-type Schottky contacts with barrier heights that are robust against external electric fields. In contrast, functionalizing Mo2B with O and OH causes the work function to energetically down- and up-shift significantly, thus forming both n-typ...

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